Ion Source - IQX 2013 & IPSU
Description - Ion Source - IQX 2013 & IPSU
Construction with the user in mind |
This new ion source is designed to satisfy a need for a robust , easy to use small area focused source ready for all tasks of the surface analysis from depth profiling to SIMS-TOF to sputter cleaning requirements.
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| GALLERY - Ion Source - IQX 2013 & IPSU |
| Specification - Ion Source - IQX 2013 & IPSU
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| High Current Density |
5mA/cm^2 |
| Spot size |
100um |
| Maximum Raster area |
10 x 10 mm^2 |
| Working distance |
10-20 mm |
| Control Connection |
Computer control of all parameters incl. spot size , raster area or focus distance |
| Power supply |
5kV /10mA psu (Use of Latest resonant Technology) |
| Construction Features - Ion Source - IQX 2013 & IPSU
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| Mounting |
Mounted on CF38 |
| Contruction Type |
Modular |
| Accessibility |
Standardized connector for filament supply and Lens system |
| Working distance |
10-20 mm |
